Deposition technology and properties of chromium oxide coatings by RF reactive sputtering
-
摘要: 研究了采用射頻反應濺射方法制備氧化鉻耐磨鍍層的技術和薄膜的性能.結果表明,采用金屬靶材進行射頻反應濺射時,由于靶材與反應氣體的反應,會出現兩種濺射模式,即金屬態濺射和非金屬態濺射,非金屬態濺射模式的沉積速率很低.氧化鉻薄膜的硬度主要決定于薄膜中Cr2O3含量,在供氧量不足時會生成低硬度的CrO,制備高硬度氧化鉻薄膜需要采用盡可能高的氧流量進行濺射.采用在基片附近局域供氧,可以實現高濺射速率下制備出高硬度的氧化鉻薄膜.Abstract: The RF reactive sputtering method was used to deposit wear resistant chromium oxide coatings and the properties of the coatings were studied. The results showed that there existed two modes of sputtering during RF reactive sputtering, i.e., metal sputtering mode and nonmetal sputtering mode caused by the reaction between the target and reactive gas. The deposition rate was very low in the nonmetal sputtering mode. The hardness of chromium oxide coatings depends mainly on the content of Cr2O3 in the coatings and low hardness CrO will form when oxygen is not enough during sputtering. Feeding oxygen near the substrate is an efficient technology for depositing hard chromium oxide coatings at high deposition rate.
-
Key words:
- chromium oxide /
- hard coating /
- magnetron sputtering /
- mechanical property
-

計量
- 文章訪問數: 202
- HTML全文瀏覽量: 57
- PDF下載量: 14
- 被引次數: 0