A Pretreatment Method for Adhesion Enhancement of CVD Diamond Coatings on Cemented Carbide Substrates
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摘要: 研究了利用(KOH+K3(Fe (CN)6)+H2O和H2SO4+H2O2)兩種溶液浸蝕硬質合金基體,分別選擇性刻蝕WC和Co的表面預處理過程.在浸蝕過的硬質合金基體上,用強電流直流伸展電弧等離子體CVD法沉積金剛石薄膜涂層.結果表明,兩步混合處理法不僅可以有效地去除硬質合金基體表面的鉆,而且還顯著粗化硬質合金基體表面,提高了金剛石薄膜的質量和涂層的附著力.Abstract: A method of two-step surface pretreatment utilizing two kinds of solutions to etch respectively the surface WC and Co in cemented carbide substrates was investigated. Diamond films were deposited by means of the High Current Extended DC Arc Plasma CVD Equipment. The results showed that the two-step method can effectively remove the Co in cemented carbide substrates and obviously roughened the surface of the cemented carbide. Enhancements both on the quality and adhesion of the diamond coatings were observed.
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Key words:
- two-step surface pretreatment /
- diamond films /
- adhesion /
- cemented carbide
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