Pulsed Electroless Nickel-Phosphorus Deposits and Thier Performances
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摘要: 脈沖化學鍍是指在化學鍍上疊加脈沖電流。本文研究了脈沖電參數(脈沖電流密度與工作比)對鍍層的成分、性能和沉積速度的影響。研究結果表明,采用脈沖化學鍍可在保持化學鍍鎳磷合金性能的同時,使沉積速度加快數倍,并發現脈沖電流對自催化的化學沉積鎳過程起促進作用。Abstract: The superposition of pulsed current on the electroless reaction is referred to the pulsed electroless plating. The effects of pulsed parameters (pulsed current desities and duty cycles) and temperatures on the compositions and performances of deposits and the depositing rates are investigated. The results showed that the depositing rates are accelerated by pulsed current without any great loss in the properties of the Ni-P deposit. In addition, the enhancement of the chemical reaction for electroless nickel deposition by pulsed current is found.
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Key words:
- electroless /
- pulse electroplating /
- nickel /
- phosphorus /
- deposit
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