Effect of Substrate Temperature on the Composition and Structure of Carbon Nitride Thin Films

ZHANG Yongping; GU Yousong; TIAN Zhongzhuo; CHANG Xiangrong; SHI Dongxia; ZHANG Xiufang

doi:10.13374/j.issn1001-053x.2000.02.018

Volume 22 Issue 2

Aug. 2021

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Article Navigation > Chinese Journal of Engineering > 2000 > 22(2): 160-162,192

ZHANG Yongping, GU Yousong, TIAN Zhongzhuo, CHANG Xiangrong, SHI Dongxia, ZHANG Xiufang. Effect of Substrate Temperature on the Composition and Structure of Carbon Nitride Thin Films[J]. Chinese Journal of Engineering, 2000, 22(2): 160-162,192. doi: 10.13374/j.issn1001-053x.2000.02.018

Citation:

ZHANG Yongping, GU Yousong, TIAN Zhongzhuo, CHANG Xiangrong, SHI Dongxia, ZHANG Xiufang. Effect of Substrate Temperature on the Composition and Structure of Carbon Nitride Thin Films[J]. Chinese Journal of Engineering, 2000, 22(2): 160-162,192. doi: 10.13374/j.issn1001-053x.2000.02.018

Citation:

ZHANG Yongping, GU Yousong, TIAN Zhongzhuo, CHANG Xiangrong, SHI Dongxia, ZHANG Xiufang. Effect of Substrate Temperature on the Composition and Structure of Carbon Nitride Thin Films[J]. Chinese Journal of Engineering, 2000, 22(2): 160-162,192. doi: 10.13374/j.issn1001-053x.2000.02.018

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Effect of Substrate Temperature on the Composition and Structure of Carbon Nitride Thin Films

doi: 10.13374/j.issn1001-053x.2000.02.018

1. Material Science and Engineering School, UST Beijing, Beijing 100083, China;
2. Beijing Laboratory of Vacuum Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080

Received Date: 1999-01-12
Available Online: 2021-08-27

Abstract

Abstract

The carbon nitride thin films have been prepared on Si substrates, using N,/CH. as reactive gases, by microwave chemical vapor deposition method. The effect of substrate temperature on the composition and structure of carbon nitride thin films were studied by X-ray photoelectron spectroscopy (XPS). As the substrate temperature increased, the N/C atomic ratios increased rapidly first and then decreased a little after a crucial temperature. Fourier transform infrared (FT-IR) and Raman spectra support the existence of C-N covalent bond.
- β-C₃N₄,
- microwave plasma chemical vapor deposition(MPCVD),
- thin films