Selection of Temperature for Chemical Vapor Deposition of Wear-Resistance TiN Films

Zhang Linrong; Zhang Fulin

doi:10.13374/j.issn1001-053x.1989.01.013

Volume 11 Issue 1

Oct. 2021

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Zhang Linrong, Zhang Fulin. Selection of Temperature for Chemical Vapor Deposition of Wear-Resistance TiN Films[J]. Chinese Journal of Engineering, 1989, 11(1): 69-73. doi: 10.13374/j.issn1001-053x.1989.01.013

Citation:

Zhang Linrong, Zhang Fulin. Selection of Temperature for Chemical Vapor Deposition of Wear-Resistance TiN Films[J]. Chinese Journal of Engineering, 1989, 11(1): 69-73. doi: 10.13374/j.issn1001-053x.1989.01.013

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Selection of Temperature for Chemical Vapor Deposition of Wear-Resistance TiN Films

doi: 10.13374/j.issn1001-053x.1989.01.013

Received Date: 1987-12-21
Available Online: 2021-10-29

Abstract

Abstract

The effects of the deposition temperature on the chemical vapor deposition (CVD) rate, the bulk hardness value of TiN deposite and the hardness and the dimension of the steel base were investigated. TiN film obtained at temperatures between 950 and 1000℃, were stoichiometric composition, golden-yellow in color, and the high hardness (Hv₁≈2000N/mm²). The hardness and dimension of the steel base depend on the deposition temperature. The variety of dimension for the steel base is less than 0.0005 if it is tempered after deposition.
- coating,
- die,
- TiN film,
- CVD