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基底偏壓對電弧/磁控復合技術制備CrAlN耐磨涂層性能的影響規律

Influence of substrate bias on the properties of CrAlN wear-resistant coating prepared by arc/magnetron composite technology

  • 摘要: 利用中頻磁控濺射與電弧離子鍍復合沉積技術在不銹鋼基體上沉積CrAlN涂層. 利用掃描電鏡(SEM)、X射線能譜(EDS)、X射線衍射(XRD)、納米壓痕測試、劃痕測試以及摩擦磨損試驗等手段,系統地研究了基底偏壓對CrAlN涂層微觀形貌、力學性能及摩擦磨損性能的影響. 隨著基底偏壓的增大,涂層表面經歷了由較為粗糙的孔洞、大顆粒向平滑的形態演變. 在?30 V基底偏壓下(絕對值表示大小)制備的涂層表現出多個強衍射峰;?60 V偏壓下,涂層沿(200)晶面方向擇優生長. 過高的基底偏壓(?150 V)加劇了沉積過程中的二次濺射效應,導致涂層沉積速率降低,并出現晶格松弛和重結晶現象. 此外,隨著基底偏壓的增加,涂層的硬度和彈性模量均呈先增加后減少趨勢. 在?60 V基底偏壓下,涂層表現出較低的磨損率,而較高偏壓下的涂層磨損機制轉變為嚴重的磨粒磨損,涂層磨損嚴重. 通過調控基底偏壓,可以有效優化CrAlN涂層的組織結構、力學性能和摩擦磨損性能. 在?60 V基底偏壓下制備的CrAlN涂層展現出優異的力學性能和耐磨性,為實際應用中提升涂層性能提供了重要的理論和實驗依據.

     

    Abstract: CrAlN coatings were deposited onto stainless steel substrates using mid-frequency magnetron sputtering and arc-ion plating. The research comprehensively analyzes how varying substrate bias voltage influences the microstructural morphology, mechanical properties, and frictional behavior of the coatings using scanning electron microscopy, energy-dispersive spectroscopy, X-ray diffraction, nanoindentation, scratch test, and friction and wear tests. As the substrate bias voltage increases, the coated surface evolves from a porous with large grains to a dense and smooth state. At a bias of ?60 V, the coating exhibited minimal surface particles and pores, resulting in the best overall surface quality and excellent adhesion to the substate. Moreover, all coatings displayed the composite properties of metal and metal nitride mixtures. In addition, substrate bias, a key process parameter, was found to affect particle activity and sputtering yield, thereby modulating element distribution in the coating and coating properties. The CrN, AlN, and CrAlN phases with face-centered cubic structures were observed by XRD. In particular, the addition of Al elements caused the diffraction peak of the CrAlN phase to shift to higher angles. At a substrate bias of ?30 V, the coating exhibited multiple strong diffraction peaks. When the substrate bias was ?60 V, the coating preferentially grew along the (200) crystal plane. However, an excessive substrate bias (?150 V) exacerbated the secondary sputtering effect during deposition, resulting in a decreased deposition rate, lattice relaxation, and recrystallization. Coatings prepared with different bias voltages consistently exhibited compressive stress, which increases with the bias voltage and, to a certain extent, improves the mechanical properties. The combined effect of growth and thermal stresses results in a higher residual stress for coatings prepared at a ?150 V substrate bias. Increasing the substrate bias initially enhanced the hardness and elastic modulus of the coating; however, these properties eventually declined. The peak hardness at a ?60 V substrate bias is attributed to lattice distortion, the Al solid solution in the CrN lattice, and internal stresses. Moreover, coatings at this bias level exhibited better elastic recovery and plastic deformation resistance. The friction coefficient increases rapidly over time before stabilizing, with the lowest average friction coefficient (0.75). At this bias ?60 V, the coating demonstrated a low wear rate, while a higher substrate bias led to severe abrasive wear. Tuning the substrate bias voltage, allowed for effectively optimizing the microstructure, mechanical properties, frictional behavior, and wear resistance of CrAlN coatings. Notably, CrAlN coatings prepared at a substrate bias of ?60 V exhibited exceptional mechanical properties and wear resistance, providing a crucial theoretical and experimental foundation for enhancing their performance in practical applications.

     

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