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氬氫摩爾比對直流電弧等離子體噴射法等離子體放電特征影響的計算

Calculation of the influence of argon-to-hydrogen mole ratio on the discharge characteristics of plasma in DC arc plasma jet

  • 摘要: 假定氬-氫等離子體處于局部熱力學平衡狀態,利用理想氣體分子運動論和經典查普曼-恩斯科格(ChapmanEnskog)方法,在獲取符合直流電弧等離子體噴射法實際工況的等離子體熱力學和輸運參數的基礎上,基于FLUENT軟件進行二次開發,添加電磁場相關的電流連續方程、安培定律等方程及洛倫茲力、焦耳熱等源項,模擬研究氬氫摩爾比對等離子體放電特征影響規律.結果表明:在氣壓為8 k Pa,工作電流150 A,氬氫摩爾比由3∶1降至1∶3時,等離子體最大流速由829 m·s-1增至1127 m·s-1,最高溫度由20600 K逐漸降低至16800 K,電弧對基體的加熱能力逐漸增強的同時使基體表面溫度均勻性變差.在其他條件不變的前提下,氬氫摩爾比為1∶2時能獲得適宜金剛石生長且相對均勻的基體表面溫度.

     

    Abstract: The effect of argon-to-hydrogen mole ratio on the discharging behavior of argon-hydrogen plasma was simulated and studied on the assumption that argon-hydrogen plasma is in a local thermodynamic equilibrium. The kinetic theory of ideal gases and the classical Chapman-Enskog method were employed in the study. The plasma thermodynamic and transport parameters consistent with the actual condition of the DC arc plasma jet method were firstly found, and secondary development was made on FLUENT software platform. Equations, like current continuum and Ampere's law, and source items, like Lorentz force and Joule heat, which are associated with electromagnetic fields were also taken into account. The results show that when the gas pressure and operating current are 8 kPa and 150 A, respectively, and the argon-to-hydrogen mole ratio changes from 3:1 to 1:3, the maximum flow rate of plasma increases from 829 to 1127 m·s-1, the maximum temperature falls from 20600 K to 16800 K, and the heating capacity of the DC arc improves while the substrate surface temperature uniformity deteriorates. Under the other conditions being unchanged, when the argon-to-hydrogen ratio is 1:2, a relatively uniform and proper substrate surface temperature can be obtained for the growth of diamond films.

     

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