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無電鍍鎳浸金處理電路板在NaHSO3溶液中的腐蝕電化學行為與失效機制

Corrosion behavior and failure mechanism of electroless nickel immersion gold processing circuit boards in NaHSO3 electrolyte solution

  • 摘要: 采用交流阻抗譜研究了無電鍍鎳浸金處理電路板在模擬電解質溶液(0.1mol·L-1 NaHSO3)中的電化學腐蝕行為,并結合體視學顯微鏡、掃描電鏡、X射線能譜分析等手段分析了試樣表面腐蝕產物形貌、組成和鍍層失效機制.無電鍍鎳浸金處理電路板在NaHSO3溶液中的耐蝕性較差,浸泡12h試樣表面局部即發生變色,伴隨有微裂紋的產生.電解液能夠通過裂紋直接侵蝕Cu基底,并在微裂紋周圍生成較多的枝晶狀結晶產物,其主要組分為Cu2S.該結晶腐蝕產物的不斷生成使局部區域中間Ni過渡層與Cu基底結合部位存在較大的橫向剪切應力,最終造成Ni鍍層的脫離與鼓泡現象.

     

    Abstract: Electrochemical impedance spectroscopy (EIS) was used to study the corrosion behavior of electroless nickel immersion gold processing printed circuit boards (PCB-ENIG) in a simulated electrolyte solution (0.1 mol. L-1 NaHSO3), and the morphology, composition of corrosion products as well as the failure mechanism of the plating layer were analyzed with the aid of stereo microscopy and scanning electron microscopy (SEM) combined with energy dispersive spectrometry (EDS). It is found that the corrosion resistance of PCB-ENIG in NaHSO3 solution is relative poor. Partial discolor appears in PCB-ENIG just immersing for 12 h, along with micro-crack generation. The electrolyte can directly erode the Cu substrate through micro-cracks, forming dendritic crystalline products around these micro-cracks, whose main composition should be Cu2S. Continuous generation of these corrosion products results in large transverse shear stress between the Ni intermediate layer and Cu substrate, and eventually bubbling and shedding of the Ni plating layer occur.

     

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