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SnAgNi釬料釬焊Ni鍍層SiCp/Al復合材料的接頭微觀結構及剪切性能

Microstructure and shear strength of solder joints of SiCp/Al composites with Ni plating with Sn-2.5Ag-2.0Ni solder

  • 摘要: 采用Sn-2.5Ag-2.0Ni焊料釬焊了具有Ni(P)/Ni(B)和Ni(P)/Ni兩種雙鍍層結構的SiCp/Al復合材料.結果表明,SnAgNi/Ni(B)/Ni(P)和SnAgNi/Ni/Ni(P)兩種接頭均生成唯一的金屬間化合物Ni3Sn4.SnAgNi焊料與Ni(B)鍍層之間的快速反應速度使Ni3Sn4金屬間化合物具有高的生長速度.時效初期的SnAgNi/Ni/Ni(P)接頭的剪切強度高于SnAgNi/Ni(B)/Ni(P)接頭,但在250h時效后其剪切強度劇烈下降,低于SnAgNi/Ni(B)/Ni(P)接頭.金屬間化合物的生長及裂紋的形成是SnAgNi/Ni/Ni(P)接頭失效的主要原因,而SnAgNi/Ni(B)/Ni(P)接頭失效的主要原因是Ni(P)鍍層中Ni原子的定向擴散使SiCp/Al復合材料與Ni(P)處產生孔洞.

     

    Abstract: An experimental study was presented to evaluate the microstructures and reliability of solder joints between Sn-2.5Ag2.0Ni solder and various Ni plating layers. Ni(P)/Ni(B) and Ni(P)/Ni double layers were used to deposit on SiCp/Al composites. The high reaction rate between Ni(B) layer and SnAgNi solder leaded to the highest growth rate of intermetallic compound (IMC) Ni3Sn4. The shear strength of solder joints with Ni(P)/Ni layer is higher than that of solder joints with Ni(P)/Ni(B) layer at the initial stage of aging, but lower than that after 250 h aging.Intermetallic layer growth and crack formation are the major reasons of failure for a SnAgNi/Ni/Ni(P) solder joint. While the failure of a SnAgNi/Ni(B)/Ni(P) solder joint is caused by the formation of holes between Ni(P) and SiCp/Al composites, which result from directional diffusion of Ni toward solder.

     

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