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熱處理對Ta/Ni0.65Co0.35薄膜微結構和磁電阻性能的影響

Effects of heat treatment on the microstructure and magnetoresistance properties of Ta/Ni0.65Co0.35 films

  • 摘要: 選用磁致伸縮系數接近于零的軟磁合金Ta/Ni0.65Co0.35作為磁敏感層,研究了熱處理對Ta/Ni0.65Co0.35薄膜織構、磁學性能和磁電阻性能的影響.制備了Barber電極結構的磁電阻元件,對磁電阻元件的輸出特性進行了測試.結果表明:真空退火可以有效降低薄膜內的應力和雜質缺陷,使晶粒尺寸增大,晶界對傳導電子的散射減少,各向異性磁電阻(AMR)值提高;真空磁場退火有利于提高薄膜的單軸各向異性,使薄膜的AMR值和磁傳感器元件的靈敏度增加.

     

    Abstract: Soft magnetic alloy Ta/Ni0.65Co0.35 films, whose magnetostriction coefficient is close to zero, were selected as sensitive layer. The effects of heat treatment on the microstructure and the anisotropie magnetoresistance (AMR) properties of Ta/Ni65Co35 films were investigated. A magnetic resistance element with Barber electrode structure was made and its output characteristics were tested. The results show that vacuum annealing can be effective in reducing the stress and impurity defect distribution in the films, increase the grain size, reduce the scattering of grain boundaries to conduction electrons, and make the AMR value effectively improve. Vacuum magnetic annealing is conducive to raising the films' uniaxial anisotropy and make the AMR value of the films and the sensitivity of the magnetic sensor element increase.

     

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