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基于CFX軟件的氮化硅反應爐內熱過程的數值模擬

Numerical simulation on thermal process in an Si_3N_4-reaction furnace with CFX

  • 摘要: 利用大型商業軟件CFX建立了高溫氮化硅反應爐內溫度場的數學模型,采用擬流體模型數值模擬爐內的層流流動,分析了氮氣體積流量、各向異性散射和輻射特性等因素對溫度場和產物質量濃度的影響.計算結果表明,為確保反應充分完全,預熱段溫度控制顯得非常重要,而氮氣體積流量起著決定性的作用;各向異性散射對徑向溫度、產物質量濃度有一定的影響;散射率對溫度場影響很小;計算值與實驗值相比較,誤差在10%之內.

     

    Abstract: A numerical simulation on the thermal process for an Si3N4-reaction furnace based on the software CFX was investigated. A similar flow model was used to numerically simulate the laminar flow in the furnace. The influence of some different factors such as volume quantity of N2, anisotropic scattering and radiation properties on the temperature field and mass density of products was studied. The results showed that the temperature control on the preheating zone was important for full reaction. However, the volume quantity of N2, i.e., inlet velocity, plays a crucial role. Anisotropic scattering influenced on the radial temperature and mass density of products. Absorption coefficient and scattering coefficient influenced little on the temperature field. The error between simulated and experimental values was less than 10%.

     

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