Ta種子層厚度及濺射速率對Ta/Ni<sub>65</sub>Co<sub>35</sub>雙層膜各向異性磁電阻和矯頑力的影響

Ta種子層厚度及濺射速率對Ta/Ni₆₅Co₃₅雙層膜各向異性磁電阻和矯頑力的影響

摘要: 研究了Ta種子層的厚度、濺射速率對Ta/Ni₆₅Co₃₅雙層膜各向異性磁電阻值(△ρ/ρ)、矯頑力和織構的影響.研究表明,適當的Ta層厚度和較高的Ta層濺射速率對提高Ta/Ni₆₅Co₃₅雙層膜的△ρ/ρ是有效的.Ta種子層的使用增大了Ta/Ni₆₅Co₃₅雙層膜的矯頑力而其濺射速率對Ta/Ni₆₅Co₃₅雙層膜矯頑力的影響很小.

Abstract: The effects of the thickness and deposition rate of Ta seed layer on the anisotropic magnetoresistance (AMP.) and coercivity ofTa/Ni₆₅Co₃₅ bilayers were investigated. The results showed that △ρ/ρ of Ta/Ni₆₅Co₃₅ bilayers could be improved at a certain thickness or higher deposition rate. The coercivity of Ta/Ni₆₅Co₃₅ films increased with the use of Ta seed layer. But the effect of the deposition rate on the coercivity of Ta/Ni₆₅Co₃₅ films was not significant.