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NH3,PH3熱分解對Ⅲ-Ⅴ族半導體MOVPE外延生長的影響

Pyrolysis Effect of NH3 and PH3 on the Composition Spaces for MOVPE Growth of III-V Semiconductors

  • 摘要: 以GaN和(Ga1-xInx)P半導體的金屬有機物氣相外延生長(MOVPE)為例分析了V族氣源物質NH3和PH3熱分解對半導體化合物外延生長成分空間的影響.根據外延生長過程中NH3和PH3實際分解狀況,建立了氣源物質不同分解狀態下的熱力學模型,進而應用Thermo-calc軟件計算出與之對應的成分空間.計算結果與實驗數據的對比表明:GaN和(Ga1-xInx)P半導體的MOVPE過程的熱力學分析必須根據V族氣源物質NH3和PH3的實際熱分解狀況,進行完全平衡或限定平衡條件下的計算和預測,完全的熱力學平衡分析僅適用于特定的溫度區段或經特殊氣源預處理的工藝過程.

     

    Abstract: Taking the Metal-Organic Vapor Phase Epitaxy (MOVPE) of GaN and (Ga1-xInx)P semiconductors as examples, the pyrolysis effect of NH3 and PH3 vapor sources on the composition spaces for growing GaN and(Ga1-xInx)P compounds has been studied. According to the situation of NH3 and PH3 pyrolysis in experimental conditions, the thermodynamic models for different pyrolysis status are built. Furthermore, the composition spaces for growing Ⅲ-Ⅴ semiconductors are calculated and predicted with the aid of the Thermocalc software. The correspondence of the theoretical analysis with the experimental data indicates that for the thermodynamic analysis of MOVPE process of GaN and (Ga1-xInx)P semiconductors, the calculation and prediction must be conducted under the conditions of the complete equilibrium or the constraint equilibrium based on the practical pyrolysis of NH3 and PH3 vapor sources. The analysis of the complete thermodynamic equilibrium is only applied to some specific temperature region or certain epitaxy process after typical pretreatment of vapor sources.

     

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