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CNx薄膜的制備和表征

Preparation and Characterization of Magnetron Sputtered CNx Films

  • 摘要: 采用在純氮氣氛中磁控濺射高純石墨靶的方法成功地制備了碳氮薄膜.研究表明,碳氮膜的硬度不僅與薄膜中的氮含量有關,更重要的是與碳氮原子之間的結合狀態有關.C≡N鍵有利于薄膜硬度的提高.高濺射功率和高偏壓能促進碳氮叁鍵的形成,從而提高薄膜硬度.

     

    Abstract: CNx films have been prepared by DC magnetron sputtering of graphite in pure nitrogen atmosphere. N/C ratio is between 0.21 and 0.42, strongly correlating with deposition parameters. The hardness and modulus are related not only to the N/C ratio,but also to the formation and the amount of C≡N triple bonds in the CNx films. High bias voltage and high sputtering power are beneficial to the increase of C≡N bands and so are helpful to increase the hardness and bulk modulus.

     

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