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雙脈沖電位法制備銅鎳層狀結構材料

Electrodeposition of Cu-Ni Layered Films by Dual Potential Pulse Method

  • 摘要: 采用旋轉圓盤電極,用雙脈沖電位法從簡單的鍍液中電沉積Cu-Ni層狀材料。研究了鍍液中銅含量、添加劑、轉速對鍍層的組成和結構的影響,并用掃描電鏡和X-射線衍射研究了鍍層的形貌和組成。結果表明:鍍層由純銅和含有少量銅的銅鎳合金層交替組成;為了降低銅在鎳層中的含量。可以采取降低鍍液中銅含量和降低轉速來實現。

     

    Abstract: A method has been developed to produce Cu-Ni composition-modulated alloys from a simple electrolyte by electrodeposition.The effects of the concentration of copper ions,additives and the speed of rotation were investigated.The results were analysed by SEM and X-ray diffraction.The result indicated that the film was alternating pure copper and copper-nickel alloy layers.If the content of copper in nickel layer is to be small, the concentration of its ions in solution must be small and the rotation speed must be low.

     

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