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用熱激發電流法研究金剛石薄膜中的陷阱

Investigation on Traps in MPCVD Diamond Films by Thermal Stimulated Current Measurements

  • 摘要: 對微波等離子體化學氣相沉積(MPCVD)的硅襯底金剛石薄膜,做了在液氮溫區注入載流子,升溫測其電流-溫度關系的實驗.觀察到as-grown樣品有明顯的熱激發電流峰.重復實驗時,峰基本消失.經氫等離子體在~900℃處理2.5h后,再重復實驗,該峰又出現.推斷熱激發電流峰是由硅襯底金剛石薄膜內氫致陷阱中的載流子撤空引起的.這些能級在金剛石禁帶中的陷阱是可以通過適當熱處理消除的.

     

    Abstract: Carrier injection under liquid nitrogen temperature followed by thermal stimulated current(TSC) measurements were carried out for MPCVD diamond films. TSC peaks were observed obviously for as-grown samples.The peaks,however,almost disappeared after the first heating process.Having undergone hydrogen plasma treatment at ~900℃ for 2.5 hours for one sample,the peaks emerge again. Thermal stimulated traps emptying is postulated to be the origin of the TSC peaks, and the traps are related to hydrogen implantation.These traps,which energy level located in the band gap of diamond, can be eliminated via proper heat treatment.

     

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