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磁控濺射類金剛石碳膜的顯微硬度

Microhardness of Magnetron Sputtered Diamond-like Thin Carbon Films

  • 摘要: 采用顯微硬度測試方法,研究在單晶硅襯底上沉積厚度僅為0.09-0.56μm的磁控濺射類金剛石碳膜的力學性能。結果表明,濺射碳膜的硬度隨濺射工藝參數呈規律性變化,且可以和碳膜的類金剛石性質以及碳膜結構的SP3和SP2成分的變化相聯系。采用Johnson復合硬度模型進行的分析表明,濺射碳膜的真實硬度在HV6000-6600之間,比天然金剛石的硬度略低。濺射類金剛石碳膜具有明顯的壓痕尺寸效應(ISE),其指數約為m=1.9。

     

    Abstract: Conventional microhardness test were employed to characterize the mechanical properties of magnetron sputtered diamond-like carbon thin films of thickness of 0.09-0.56 mirons. It was found that microhardness of magnetron sputtered DLC varies with sputtering parameters in a systematic way and it can be related to the diamond-like properties and the component of SP2 and SP3 structures of the DLC. Analysis from DLC of 0.3073μm which were simu-taneously sputtered onto stainless steel and single crystal silicon substrate at 200W showed that the true hardness of the DLC was ranging between HV 6000-6600, which is close to the hardness of natural diamond. Pronounced indentation size effect (ISE) was observed, and the ISE index of 1.9 for the DLC was obluined.

     

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