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鋁的壁壘型陽極氧化膜的透射電鏡觀察

Observation of Barrier Anodic Films on Aluminium by TEM

  • 摘要: 發現了(NH4)2MoS4水溶液中可生成鋁的壁壘型陽極氧化膜。用超薄切片,透射電鏡結合離子注入惰性原子標記層的技術對膜的形貌、成分和生長過程中的離子遷移進行了觀察和分析;用EDAX分析方法來探測到膜中含有溶液陰離子的成分,陽極氧化過程中膜在基體/膜界面和膜/溶液界面同時生長。陽極氧化的電流密度為1.0mA/cm2時,Al3+離子的表觀遷移率為0.44。

     

    Abstract: It was found that barrier anodic film can be formed on aluminium in (NH4)2MoS4 aqueous solution. Ultramicrotomed sectioning allied with analytical TEM and ion implantation of xenon marker techniques were employed to investigate the morphology, chemical composition of the film and to measure the ion migration during anodizing. Species characterizing the electrolyte (Mo) was not detected in the film section with EDAX analysis. It was found that film growth proceeds at both the alumium/film and the film/electrolyte interfaces. The apparent migration ratio of aluminium ions is 0.44 when the anodizing current density is 1.0mA/cm2.

     

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