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磁控濺射涂層的耐蝕性

Corrosion Resistances of Magnetic Sputtering Coatings

  • 摘要: 通過采用磁控濺射工藝,將兩種鐵基和鎳基材質的靶材濺射到基材(1Cr18Ni9Ti)上,形成4種薄膜。對靶材、基材和薄膜等分別在不同濃度硫酸中的耐腐蝕性進行了測量,并對薄膜在0.05mol/L硫酸中的耐點蝕性進行了研究。通過對Tafel曲線、循環極化曲線及顯微組織的分析,結果表明:濺射后薄膜組織為微晶,薄膜的耐蝕性普遍比濺射材前靶的耐蝕性要好;薄膜耐點蝕性很好。

     

    Abstract: By using magnetic sputtering disposition four films were made by sputtering two iron target materials and two nickel target materials on a base material (1Cr18Ni9Ti). Corrosion resistances of these films, target materials and base material mentioned above were studied in various H2SO4 concentration solutions and the pitting resistance of the film were also investigated in 0.05mol/L H2SO4 solution. It has been found from the Tafel Plots, the cyclic polarization measurements and the microscopic internal analysis that sputtered films are microcrystal organization and have better corrosion resistances including pitting resistance than the target material without sputtering.

     

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