硬質合金上化學氣相沉積TiC和TiC<sub>X</sub>N<sub>Y</sub>的研究

硬質合金上化學氣相沉積TiC和TiC_XN_Y的研究

摘要: 在TiCl₄-C₆H₅CH₃-H₂和TiCl₄-C₆H₅-H₂-N₂體系中,以YG₈硬質合金為基體,用化學氣相沉積(CVD)法,研究了溫度,反應物輸入濃度對沉積TiC和TiC_xN_y涂層的沉積速度,顯微硬度和形貌的影響。結果表明:TiC沉積速度,顯微硬度隨沉積溫度升高而增大,對TiC沉積層的形貌也有較大的影響。TiC和TiC_xN_y的沉積速度、顯微硬度隨反應物摩爾比(mc/Ti)增加到某一最大值后又下降;mc/Ti=1時,TiC硬度呈最佳值。mc/Ti=0.87時,TiC_xN_y硬度出現最大值。此外,還對基體一涂層間是否出現η相進行了分析。并測定了在1223~1323K間TiC沉積反應的表觀活化能為157.9kJ/mol。

Abstract: The deposition ratd and microhardnoss of the coating ofTiC and TiC_xN_y increase with input molar ratio (m_c/Ti) and the maximum microhardness of TiC and TiC_xN_y are achieved as the ratio is 1 and 0.87 respectively. The coalings identified by X-ray di ff ractometer is TiC and TiC_xN_y. When m=0.94-1.47. deposition temperature at 1 223-1 323 K. the η phase at interlayer between the substrate and TiC coaling is not formed; m_c/Ti=0.68-1.54. at 1 248K, N₂/H₂=1/2. the coating only is TiC_xN_y; m_c/Ti ≤ 0.28. the η phase is formed. The apparent activation energy of TiC is 157.9 kJ/mol. It proves that the deposition process is controlled by surface process.