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化學氣相沉積耐磨涂層TiN的溫度選擇

Selection of Temperature for Chemical Vapor Deposition of Wear-Resistance TiN Films

  • 摘要: 化學氣相沉積(CVD)TiN涂層在模具上涂復3~10μm可使模具壽命提高3~4倍。本文研究指出:沉積溫度對沉積速率、涂層硬度及對基體Cr12MoV硬度和尺寸都有影響。在950~1000℃間可以得到接近化學計量的TiN,其硬度Hv1≈20000N/mm2,基體尺寸變化在萬分之五以內。

     

    Abstract: The effects of the deposition temperature on the chemical vapor deposition (CVD) rate, the bulk hardness value of TiN deposite and the hardness and the dimension of the steel base were investigated. TiN film obtained at temperatures between 950 and 1000℃, were stoichiometric composition, golden-yellow in color, and the high hardness (Hv1≈2000N/mm2). The hardness and dimension of the steel base depend on the deposition temperature. The variety of dimension for the steel base is less than 0.0005 if it is tempered after deposition.

     

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