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N2/H2比對化學氣相沉積氮化鈦涂層的影響

Influence of Different N2/H2 Ratios by Chemical Vapor Deposition on the Performance of TiN Films

  • 摘要: 本文研究了N2/H2比對氮化鈦涂層的晶格常數、硬度、沉積速率的影響,在N2/H2≈1/2時得到組成近似于化學計量的氮化鈦,涂層硬度和沉積速率最高,涂層模具的壽命比不涂層的可提高4倍。

     

    Abstract: Titanium nitride can be coated on the steel-base and cemented-carbides to improve the resistant to wear and corrosion.
    The effect of different N2/H2 ratios on the lattice parameter, hardness and the rate of the TiN deposition are researched in this paper. The results show that when optimum N2/H2 ratio appriximates to 0.5, the stoichiometric TiN will be formed. The hardness and the deposition rate of TiN film reach their maximum, and the lifetime of the treated surface increases by three times as compared with that of untreated ones.

     

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