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電鍍錫、鉛錫鍍層與基體銅形成化合物的動力學和引線可焊性

THE INVESTIGATIONS OF THE KINETICS ON INTERMETALLIC COMPOUND GROWTH AT THE INTERFACE OF THE SUBSTRTE COPPER AND TIN OR TIN-LEAD COATING AND THE SOLDERABILITY

  • 摘要: 本文對電鍍錫和含64~76%Sn的鉛錫鍍層的銅導線進行了銅錫金屬間化合物生長速度的研究。在100±1℃和155±2℃的溫度下,經不同的老化時間后測定了化合物層的厚度,并得到了化合物生長厚度與時間、溫度的關系式。實驗測得在共晶成分附近的鉛錫鍍層其化合物生長速度快于純錫鍍層。引線在室溫下放置近一年未發現可見的化合物層。本文還討論了剩余鍍層厚度與引線可焊性的關系。

     

    Abstract: The studies ot copper-tin intertnetallic compounds growth rates at the interface of the copper substrate and tin or lead-64-76% tin coating were conducted in this paper. The thickness of intermetallic compound layers formed with a variety of aging time at 100±1℃ and 155±2℃ had been measued. The dependences of the intermetallic compound thickness on time and temperature were shown. It had experimentally been observed that the growth rate of compound in lead-tin coating at near eute-ctic point is faster than that in purely tin coating. The compound layers have not been detected on the leader which had been stored at room temperature for about a year. In addition, the relationship between the remaining coating and the solderability of leader was also discussed.

     

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